Research Stay of Stefan Schröder

 

Visiting period: 30.01.2017 – 18.05.2017
Visiting institution: Department of Chemical Engineering, Gleason Group Massachusetts Institute of Technology (MIT)Cambridge, MA, USA
Visiting scientists: Prof. Karen K. Gleason

 

I spend my external research stay in the group of Prof. Gleason. The group belongs to the Department of Chemical Engineering at the MIT and has high expertise in chemical vapor Deposition (CVD) polymers. My research was focused on low-k polymer dielectrics deposited by initiated chemical vapor deposition (iCVD). This is highly related to my work for the CRC 1261. The iCVD technique was used to deposit amorphous fluoropolymer thin films and organosilicon polymer-air composites on conductive substrates. The samples were characterized by impedance spectroscopy. The free volume of the polymer has a significant influence on the dielectric properties. Effective medium theory was used to evaluate the results.

Stefan Schröder